Epson Hosts ‘Digital Couture’ Fashion Show

Epson’s Digital Couture Project will hit the runways of New York on February 7. Working under the theme “Textile Stories,” 13 design teams from North and Latin America will showcase fashion produced via digital textile printers. Among them will be garments produced on Robustelli-Epson machines, a fashion debut for the technology after the . The designers include:

• Vanesa Krongold
• Daniel Barreira
• Sarah Stevenson
• Daniela Hoehmann
• Ricardo Pava
• Daniel Del Barco and Sonia Chang
• Carlos de Moya
• Miguel Moyano, Alex Polo, and Maria Susana Rivadeneira Simball
• Leonardo Mena
• Susan Wagner
• Lindsay Degen
• Sarah Richards
• Kanbar College of Design Engineering and Commerce, Philadelphia University

The third annual event will also feature a kickoff keynoted by Minoru Usui, global president of Epson. A panel of fashion and apparel experts, moderated by Wall Street Journal VP and Publisher Anthony Cenname, will speak on technology’s role in fashion.

“With the market for worldwide expected to grow annually at almost 25 percent, this is a very exciting opportunity,” says Keith Kratzberg, president and CEO of Epson America, in a release.

Follow on Twitter for live updates from the event, and stay tuned for more behind-the-scenes coverage in our March issue. Meanwhile, check out what we saw at .